Ústav fyzikálního inženýrství - obor Fyzikální inženýrství a nanotechnologie Ústav fyzikálního inženýrství - obor Fyzikální inženýrství a nanotechnologie
ÚFI 
ÚFI
Výuka
Fyzikální inženýrství a nanotechnologie
3. ročník, I. stupeň

   Příprava nízkodimenzionálních struktur


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Odkazy:

OSA (the Optical Society) Student chapter of Czech Republic

ÚFI/Výuka/Fyzikální inženýrství a nanotechnologie/3. ročník, I. stupeň/Příprava nízkodimenzionálních struktur     

Příprava nízkodimenzionálních struktur

Program přednášek/cvičení pro letní semestr 2019:

  •  Lesson 1 - Introduction to low-dimensional structures, bottom-up and self-assembly (velikost 4.05 MB) (week 1+2) General introduction, quantum dots, fullerenes, nanowires, 2D materials, chemical approaches to growth, physical approaches to growth, self-assembly

  •  Lesson 2 - Top-down technology, Hybrid approaches (velikost 2.81 MB) (week 3) SPM-based lithography, Resist based technology (optical and electron beam lithography), hybrid approaches to assembly)

  •  Lesson 3 - Magnetron/Ion Beam sputtering, evaporation and spintronics (J. Arregi, week 4) This lecture will focus on different thin film growth strategies, ranging from evaporation to sputtering techniques. Special emphasis will be given to the topic of epitaxial films and heterostructures. The role of these deposition techniques on current technology, such as in semiconductor multilayer structures and magnetic recording media, will be sketched.

  •  Lesson 5 - Chemical Vapor Deposition (week 5) Chemical Vapor Deposition will be explained, including doping in nanostructures and blue diode story.

  • {Practical session at MU} (week 6) Introduction to clean room

  •  Lesson 6 - Atomic Layer Deposition (week 7) The lecture will provide a brief overview of technology used in semiconductor industry. Most important technological landmarks will be introduced, with emphasis on Atomic Layer Deposition.

  • {Practical session at MU} (weeks 8-9) Introduction to clean room, fabrication of capacitor/resistor by optical lithography, electrical measurements of the devices.

  •  Lesson 4 - Molecular beam epitaxy (H. Detz, week 10) Molecular beam expitaxy will be explained with emphasis on applications in solid state lasers.

  •  Lesson 7 - Focused Particle Beam enhanced lithography (week 11) This lecture will focus on following points:interactions of primary ions with condensed matter, focused ion beam system technology, micro- and nanofabrication, focused ion beam induced processes and general and special applications of FIB

  •  Lesson 8 - Composition and structure of low dimensional structures (week 12) A general overview on the structural and composition analysis tools of thin films and nanostructures will be given, including x-ray diffraction, spectroscopic ellipsometry, SEM/TEM, and surface science analytical techniques with hifg spatial resolution.

  •  Colloquium (velikost 13.75 MB) (week 12)

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