ÚFI/Výuka/Fyzikální inženýrství a nanotechnologie/3. ročník, I. stupeň/Příprava nízkodimenzionálních struktur     

Příprava nízkodimenzionálních struktur

Program of lectures is below. The slides for each lecture are available via Elearning (www.vutbr.cz).

• {Lesson 1 - Introduction to low-dimensional structures, bottom-up and self-assembly} (week 1+4) General introduction, quantum dots, fullerenes, nanowires, 2D materials, chemical approaches to growth, physical approaches to growth, self-assembly

• {Lesson 2 - Top-down technology, Hybrid approaches} (week 2) SPM-based lithography, Resist based technology (optical and electron beam lithography), hybrid approaches to assembly)

• {Lesson 3 - Magnetron/Ion Beam sputtering, evaporation and spintronics} (J. Arregi, week 3) This lecture will focus on different thin film growth strategies, ranging from evaporation to sputtering techniques. Special emphasis will be given to the topic of epitaxial films and heterostructures. The role of these deposition techniques on current technology, such as in semiconductor multilayer structures and magnetic recording media, will be sketched.

• {Practical sessions at MU} (weeks 5-7) Introduction to clean room. Instructions to read before the lesson can be found here. Check "Navody pro ulohu Praktikum v čistých prostorách - resistor a kondenzátor." Fabrication of capacitor/resistor by optical lithography, electrical measurements of the devices.

• {Lesson 5 - Etching and Chemical Vapor Deposition} (week 8) Wet and dry etching will be briefly discussed. Chemical Vapor Deposition will be explained, including doping in nanostructures and blue diode story.

  More reading on blue diode story by Nakamura here.

• {Lesson 4 - Molecular beam epitaxy} (H. Detz, week 9) Molecular beam expitaxy will be explained with emphasis on applications in solid state lasers.

• {Lesson 6 - Atomic Layer Deposition} (week 10) The lecture will provide a brief overview of technology used in semiconductor industry. Most important technological landmarks will be introduced, with emphasis on Atomic Layer Deposition.

• {Lesson 7 - Focused Particle Beam enhanced lithography} (week 11) This lecture will focus on following points:interactions of primary ions with condensed matter, focused ion beam system technology, micro- and nanofabrication, focused ion beam induced processes and general and special applications of FIB

• {Lesson 8 - Composition and structure of low dimensional structures} (week 12) A general overview on the structural and composition analysis tools of thin films and nanostructures will be given, including x-ray diffraction, spectroscopic ellipsometry, SEM/TEM, and surface science analytical techniques with hifg spatial resolution.

• {Colloquium} (week 13)