ÚFI/Výuka/Fyzikální inženýrství a nanotechnologie/3. ročník, I. stupeň/Příprava nízkodimenzionálních struktur
Příprava nízkodimenzionálních struktur
Program přednášek/cvičení pro letní semestr 2019:
General introduction, quantum dots, fullerenes, nanowires, 2D materials, chemical approaches to growth, physical approaches to growth, self-assembly
SPM-based lithography, Resist based technology (optical and electron beam lithography), hybrid approaches to assembly)
This lecture will focus on different thin film growth strategies, ranging from evaporation to sputtering techniques. Special emphasis will be given to the topic of epitaxial films and heterostructures. The role of these deposition techniques on current technology, such as in semiconductor multilayer structures and magnetic recording media, will be sketched.
Molecular beam expitaxy will be explained with emphasis on applications in solid state lasers.
Wet and dry etching will be briefly discussed. Chemical Vapor Deposition will be explained, including doping in nanostructures and blue diode story.
More reading on blue diode story by Nakamura here.
Introduction to clean room. Instructions to read before the lesson can be found here. Check "Navody pro ulohu Praktikum v čistých prostorách - resistor a kondenzátor."
The lecture will provide a brief overview of technology used in semiconductor industry. Most important technological landmarks will be introduced, with emphasis on Atomic Layer Deposition.
Introduction to clean room, fabrication of capacitor/resistor by optical lithography, electrical measurements of the devices.
A general overview on the structural and composition analysis tools of thin films and nanostructures will be given, including x-ray diffraction, spectroscopic ellipsometry, SEM/TEM, and surface science analytical techniques with hifg spatial resolution.
Colloquium (week 13)